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Electronics-Grade Ultrapure Water (UPW) Equipment for manufacturing semiconductors, microchips, and flat-panel displays.

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SHANGHAI CHONGYANG WATER TREATMENT EQUIPMENT CO.,LTD

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Electronics-Grade Ultrapure Water (UPW) Equipment for manufacturing semiconductors, microchips, and flat-panel displays.

Name: ElectronicsGrade Ultrapure Water UPW Equipment for manufacturing semiconductors microchips and flatpanel displays
Brand: CHONGYANG
Price: 1 USD

Quality Electronics-Grade Ultrapure Water (UPW) Equipment for manufacturing semiconductors, microchips, and flat-panel displays. for sale

Brand Name : CHONGYANG

Model Number : CY-UP -10000L/H

Certification : ISO ,CE

Place of Origin : China

MOQ : 1

Price : Negotiation

Payment Terms : L/C, T/T

Supply Ability : 100 Sets/Month

Delivery Time : With 30-40 Days

Packaging Details : According to export standard

Product Name : RO Plant

Capacity : 10000L/H-100000L/H

Material : Stainless Steel 304 , 316L UPVC

RO Membrane : Double RO ,Single RO

Water Tank : Raw Water Tank,RO Water tank ,Middle Water Tank

Pr-treatment : Multi-medium filter, Activated Carbon filter, Softener

Pump Brand : Grundfos , CNP

RO Housing Material : SS, FRP

Resistivity : 18.2 MΩ·cm

Valve : Butterfly Valve

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Detailed Specifications for Electronics-Grade Ultrapure Water (UPW) Equipment

Electronics-grade Ultrapure Water (UPW) equipment is designed to produce water of the highest purity, critical for manufacturing semiconductors, microchips, and flat-panel displays. The system must reliably achieve a resistivity of 18.2 MΩ·cm at 25°C and have extremely low levels of ions, particles, bacteria, and Total Organic Carbon (TOC).

1. Capacity (Flow Rate)

The flow rate of a UPW system is highly customizable based on the fab’s requirements. Systems are typically sized by their hourly or daily production capacity.

Standard Range:
- Recirculation Flow: 50 m³/h – 200 m³/h (220 – 880 GPM)
- Make-up Flow: 10 m³/h – 100 m³/h (44 – 440 GPM)

2. Key Specifications

Parameter	Specification	Purpose / Rationale
Final Water Quality
Resistivity	18.2 MΩ·cm at 25°C	Measures ionic purity. The theoretical maximum.
TOC (Total Organic Carbon)	< 1 ppb (μg/L)	Prevents organic contamination on wafers.
Particle Count (≥ 0.05 μm)	< 100 / liter	Eliminates defects in nanoscale circuits.
Silica (SiO₂)	< 0.1 ppb	Preforms insulating oxide layers.
Bacteria	< 0.01 CFU/mL	Prevents biofilms and microbial contamination.
System Components
Pretreatment	Multi-media filters, Carbon filters, Softeners	Removes suspended solids, chlorine, and organics.
Primary Purification	Double-Pass RO (Reverse Osmosis)	Removes >99% of dissolved salts and organics.
Polishing	EDI (Electrodeionization)	Continuous, chemical-free removal of residual ions.
Final Polish	UV Lamp (185nm & 254nm), Polishing Mixed Bed DI	185nm UV oxidizes organics; final polishing ensures 18.2 MΩ·cm.
Distribution	Continuous Recirculation Loop with 0.1 μm Filters	Maintains purity at point of use and prevents bacterial regrowth.

3. Materials of Construction

The choice of materials is critical to prevent the system itself from becoming a source of contamination.

Piping & Fittings: PVDF (Polyvinylidene Fluoride) is the industry standard for the high-purity loop. 316L Stainless Steel (Electropolished, Low Carbon) is used for tanks and some pretreatment components.
Valves: PVDF Diaphragm Valves or PP (Polypropylene) Valves are standard to minimize dead legs and contamination.
Pumps: Stainless Steel (316L) with high-quality seals.
Instrumentation: All wetted parts must be compatible (e.g., PVDF, PFA, 316L SS) to avoid leaching.

4. Power Consumption

The power requirement is significant and varies greatly with the system’s capacity. Major power consumers are high-pressure RO pumps and UV lamps.

Typical Range: 50 kW – 500 kW
- A small system (10 m³/h) may require ~50-100 kW.
- A large system (100 m³/h) can require 300-500 kW or more.

Summary:

An 18.2 MΩ·cm Ultrapure Water System is a complex, multi-stage purification train. Its specifications—from the high flow rates and extreme water quality parameters to the inert PVDF materials and substantial power needs—are all engineered to meet the uncompromising purity demands of the electronics industry, ensuring high manufacturing yields and product performance.

Electronics-Grade Ultrapure Water (UPW) Equipment for manufacturing semiconductors, microchips, and flat-panel displays. Images

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